[1]. CVD synthesis of monolayer MoS 2 using Na compounds as additives to enhance two-dimensional growth
Jpn. J. Appl. Phys. 62/7 1-6 075503 （2023年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] Yuki Goto, Akihisa Ogino [URL] [DOI]
[2]. Effect of hydrogen ion dose and sample temperature on hydrogenation of Mg oxides using microwave excited hydrogen plasma
Jpn. J. Appl. Phys. 61/ 1-7 SI1012 （2022年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] Ryohei Kurebayashi, Akihisa Ogino [URL] [DOI]
[3]. Effect of radical on defect and molecular structure of monolayer MoS2 by low temperature plasma treatment
Jpn. J. Appl. Phys. 61/ 1-7 SI1006 （2022年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] Shuya Asada, Akihisa Ogino [URL] [DOI]
[4]. Sub-micrometer plasma-enhanced chemical vapor deposition using an atmospheric pressure plasma jet localized by a nanopipette scanning probe microscope
J. Micromech. Microeng. 32/1 015006- （2021年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Sho Yamamoto, Kenta Nakazawa, Akihisa Ogino, Futoshi Iwata [URL] [DOI]
[5]. Enhancement of thermionic emission and conversion characteristics using polarization- and band-engineered n-type AlGaN/GaN cathodes
J. Vac. Sci. Technol. B39/ 062207- （2021年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Shigeya Kimura, Hisashi Yoshida, Hisao Miyazaki, Takuya Fujimoto, Akihisa Ogino [URL] [DOI]
[6]. Micromachining of polymers using atmospheric pressure inductively coupled helium plasma localized by a scanning nanopipette probe microscope
J. Micromech. Microeng. 31/6 065008- （2021年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Shun Toda, Kenta Nakazawa, Akihisa Ogino, Masaru Shimomura, Futoshi Iwata [URL] [DOI]
[7]. Surface polarity dependence of thermionic emission and conversion characteristics of n-type GaN cathodes
J. Vac. Sci. Technol. B39/ 014201- （2021年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Shigeya Kimura, Hisashi Yoshida, Hisao Miyazaki, Takuya Fujimoto, Akihisa Ogino [URL] [DOI]
[8]. Atmospheric He/O2 plasma jet fine etching with a scanning probe microscope
AIP Advances 10/ 095103- （2020年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Kenta Nakazawa, Sho Yamamoto, Ei Nakagawa, Akihisa Ogino, Masaru Shimomura, and Futoshi Iwata [URL] [DOI]
[9]. Thermionic emission and conversion properties of n-type AlGaN thin film cathodes grown on 6H-SiC substrates
Jpn. J. Appl. Phys. 59/ SGGF01-1-SGGF01-7 （2020年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Shigeya Kimura, Hisashi Yoshida, Shota Uchida, Akihisa Ogino [DOI]
[10]. Surface Electronic Properties of Si-Doped AlGaN and Thermionic Emission Characteristics with Adsorption ofAlkali Metal Atoms
Phys. Status Solidi A 2019/ 1900719-1-1900719-6 （2019年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Shigeya Kimura, Hisashi Yoshida, Shota Uchida, Akihisa Ogino [DOI]
[11]. Surface Modification of Fluorin Contained Resins using an Elongated Parallel Plate Electrode Type Dielectric Barrier Discharge Device
Journal of Photopolymer Science and Technology 31/No.3 379-383 （2018年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] M. Nagatsu, K. Sugiyama , I. Motrescu, M. A. Ciolan, A. Ogino, N. Kawamura
[12]. Development of a scanning nanopipette probe microscope for fine processing using atmospheric pressure plasma jet
Jpn. J. Appl. Phys. 55/(num) 08NB15-1-08NB15-5 （2016年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] Daisuke Morimatsu,Hiromitsu Sugimoto,Atsushi Nakamura,Akihisa Ogino,Masaaki Nagatsu,Futoshi Iwata
[13]. The effect of substrate on the low-temperature carbon nanomaterials growth by microwave excited surface-wave plasma chemical vapor deposition
Journal of Physics: Conferences Series 417/(num) 012042- (zzz) （2013年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] [責任著者]R V Bekarevich [共著者]S. Miura,Akihisa Ogino,A.V. Rogachev,M. Nagatsu [DOI]
[14]. Sterilization Method for Medical Container Using Microwave-Excited Volume-Wave Plasma
Plasma Process. Polym. 9/6 590-596 （2012年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Masaaki Nagatsu [共著者]Ying Zhao,Ryota Mizutani,Yuya Fujioka,Akihisa Ogino
[15]. Low Temperature Growth of Carbon Nanomaterials on the Polymer Substrates by Microwave Plasma Technique
Trans. Mat. Res. Soc. Japan 37/(num) 157-160 （2012年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]R.V. Bekarevich [共著者]S. Miura,Akihisa Ogino,A.V. Rogachev,M. Nagatsu
[16]. Micro-patterning of Functional Groups onto Polymer Surface Using Capillary Atmospheric Pressure Plasma Jet
J. Photopolym. Sci. Technol. 25/4 529-534 （2012年） [査読] 無 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Iuliana Motrescu [共著者]Akihisa Ogino,Masaaki Nagatsu
[17]. Low Temperature Growth of Carbon Nanomaterials on the Polymer Substrate Using Ion Assisted Microwave Plasma CVD
J. Photopolym. Sci. Technol. 25/4 545-550 （2012年） [査読] 無 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] [責任著者]Raman Bekarevich [共著者]Shota Miura,Akihisa Ogino,Aleksandr V. Rogachev,Masaaki Nagatsu
[18]. Plasma-activated immobilization of biomolecules onto graphite-encapsulated magnetic nanoparticles
Carbon 50/(num) 1253-1261 （2012年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Teguh Endah Saraswati [共著者]Akihisa Ogino,Masaaki Nagatsu [DOI]
[19]. Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet
Appl. Phys. Express 5/(num) 056201- (zzz) （2012年） [査読] 有 [国際共著論文] 該当する
[責任著者・共著者の別] 共著者
[著者] [責任著者]Hisashi Nakahiro [共著者]Peng Zhao,Akihisa Ogino,Wei Zheng,Yuedong Meng,Masaaki Nagatsu [URL]
[20]. Effect of Water Vapor Addition on the Microwave-Excited Ar Plasma-Induced Poly(ethylene glycol) Polymerization and Immobilization of L-Cysteine
Appl. Phys. Express 5/(num) 046201- (zzz) （2012年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Zhenyi Shao [共著者]Akihisa Ogino,Masaaki Nagatsu [URL]
[21]. Optimization of amino group introduction onto polyurethane surface using ammonia and argon surface-wave plasma
Jpn. J. Appl. Phys 50/(num) 08JF06- (zzz) （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] [責任著者]Akihisa Ogino [共著者]Suguru Noguchi,Masaaki Nagatsu [URL]
[22]. Immobilization of L-Cysteine onto Polyethylene Glycol Polymerized by Surface-wave Plasma
Jpn. J. Appl. Phys 50/(num) 08JF03- (zzz) （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Zhenyi Shao [共著者]Akihisa Ogino,Masaaki Nagatsu [URL]
[23]. Effects of N2–O2 Gas Mixture Ratio on Microorganism Inactivation in Low-Pressure Surface Wave Plasma
Jpn. J. Appl. Phys 50/(num) 08JF05- (zzz) （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] [責任著者]Ying Zhao [共著者]Akihisa Ogino,Masaaki Nagatsu [URL]
[24]. Effects of Nitrogen and Oxygen Radicals on Low-temperature Bio-molecule Processing
Jpn. J. Appl. Phys 50/(num) 08JF07- (zzz) （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Iuliana Motrescu [共著者]Akihisa Ogino,Shigeyasu Tanaka,Taketomo Fujiwara,Shinya Kodani,Masaaki Nagatsu [URL]
[25]. Mass spectrometric study on inactivation mechanism of spore-forming bacteria by low-pressure surface-wave excited oxygen plasma
Appl. Phys. Lett. 98/(num) 191501- (zzz) （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Ying Zhao [共著者]Akihisa Ogino,Masaaki Nagatsu [DOI]
[26]. Low Temperature Plasma Treatment for Immobilization of Biomaterials on Polymer Surface
Advanced Materials Research 222/(num) 297 -300 （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 責任著者
[著者] [責任著者]Akihisa Ogino [共著者]Suguru Noguchi,Masaaki Nagatsu [URL]
[27]. Surface Functionalization of Graphene Layer-Encapsulated Magnetic Nanoparticles by Inductively Coupled Plasma
Advanced Materials Research 222/(num) 134-137 （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Masaaki Nagatsu [共著者]Teguh E. Saraswati,Akihisa Ogino [URL]
[28]. Surface modification of graphite encapsulated iron nanoparticles by plasma processing
Diam. Relat. Mater. 20/(num) 359-363 （2011年） [査読] 有 [国際共著論文] 該当する
[責任著者・共著者の別] 共著者
[著者] [責任著者]Teguh E. Saraswati [共著者]Takafumi Matsuda,Akihisa Ogino,Masaaki Nagatsu [DOI]
[29]. Oxygen functionalization of multiwall carbon nanotubes by Ar/H2O plasma treatment
Diam. Relat. Mater. 20/(num) 153-156 （2011年） [査読] 有 [国際共著論文] 該当する
[責任著者・共著者の別] 共著者
[著者] [責任著者]Changlun Chen [共著者]Akihisa Ogino,Xiangke Wang,Masaaki Nagatsu [DOI]
[30]. Improvement of UV emission from highly crystalline ZnO nanoparticles by pulsed laser ablation under O2/He glow discharge
Appl. Phys. Lett. 98/(num) 051908- (zzz) （2011年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Qiang Ma [共著者]Teguh Endah Saraswati,Akihisa Ogino,Masaaki Nagatsu [DOI]
[31]. Study of the synthesis of tungsten trioxide nanostructured arrays by tungsten hot filament chemical vapor deposition method and their field emission properties
J. Vac. Sci. Technol. B 28/(num) C2A98-C2A10 （2010年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Di Lu [共著者]Bo Liang,Akihisa Ogino,Masaaki Nagatsu [DOI]
[32]. Discharge characteristics of a nano-sized electrode with aligned carbon nanotubes grown on a tungsten whisker tip under various gas conditions
J. Phys. D: Appl. Phys. 43/(num) 275202-275207 （2010年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Bo Liang [共著者]Akihisa Ogino,Masaaki Nagatsu [DOI]
[33]. Pre- and Post-Plasma Treatments of Polyethylene Glycol Polymerization on Polymer Surface for Immobilization of L-cysteine
J. Photopolym. Sci. Technol. 23/(num) 561-566 （2010年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Zhenyi Shao [共著者]Akihisa Ogino,Masaaki Nagatsu [URL]
[34]. Production of ultrafine atmospheric pressure plasma jet with nano-capillary
Thin Solid Films 518/(num) 3457-3460 （2010年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Ryota Kakei [共著者]Akihisa Ogino,Futoshi Iwata,Masaaki Nagatsu [DOI]
[35]. Cathodoluminescence Property of ZnO Nano-phosphors Fabricated by Pulsed Nd:YAG Laser Ablation in Plasma Circumstanc
Thin Solid Films 518/(num) 3517-3521 （2010年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Qiang Ma [共著者]Akihisa Ogino,Masaaki Nagatsu [DOI]
[36]. Effects of VUV/UV radiation and oxygen radicals on low-temperature sterilization in surface-wave excited O2 plasma
Thin Solid Films 518/(num) 3590-3594 （2010年） [査読] 有 [国際共著論文] 該当しない
[責任著者・共著者の別] 共著者
[著者] [責任著者]Ying Zhao [共著者]Mrityunjai K. Singh,Akihisa Ogino, Masaaki Nagatsu [DOI]
[37]. Amino group introduction onto multiwall carbon nanotubes by NH3/Ar plasma treatment
Carbon 48/(num) 939-948 （2010年） [査読] 有 [国際共著論文] 該当する
[責任著者・共著者の別] 共著者
[著者] [責任著者]Changlun Chen [共著者]Bo Liang,Di Lu,Akihisa Ogino,Xiangke Wang,Masaaki Nagatsu [DOI]
[38]. Plasma treatment of multiwall carbon nanotubes for dispersion improvement in water
Appl. Phys. Lett. 96/(num) 131504- (131506 （2010年） [査読] 有 [国際共著論文] 該当する
[責任著者・共著者の別] 共著者
[著者] [責任著者]Changlun Chen [共著者]Akihisa Ogino,Xiangke Wang,Masaaki Nagatsu [DOI]
[39]. Inactivation Factors of Spore Forming Bactria Using Low-pressure Microwave Plasmas in N2 and O2 Gas Mixture
New Journal of Physics 11/ 115027-115041 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. K. Singh [共著者]A. Ogino,M. Nagatsu
[40]. Oxygen Functionalization of Multiwall Carbon Nanotubes by Microwave Excited Surface-Wave Plasma Treatment
JOURNAL OF PHYSICAL CHEMISTRY C 113/18 7659-7665 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]C. L. Chen [共著者]B. Liang,A. Ogino,X. Wang,M. Nagatsu
[41]. 酢酸添加表面波励起アルゴンプラズマを用いた樹脂表面親水性の向上
電気学会論文誌A 129/2 103-107 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]安澤栄気 [共著者]Martin Kral,荻野明久,永津雅章
[42]. Field Emission Characteristics of Nano-sized Dot Array Carbon Nanotube Emitters Fabricated by Direct-current Plasma Chemical Vapor Deposition
DIAMOND AND RELATED MATERIALS 18/2-3 548-552 （2009年）
[責任著者・共著者の別] 共著者
[著者] [責任著者]T. Matsuda [共著者]J. Sato,T. Ishikawa,A. Ogino,M. Nagatsu
[43]. Study of Inactivation Factors in Low Temperature Microwave Plasma Sterilization
電気学会論文誌A 129/1 30-34 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. K. Singh [共著者]L. Xu,A. Ogino,M. Nagatsu
[44]. Generation Technique and Sterilization Application of Microwave-Excited Plasma inside a Medical Container
J. of Plasma and Fusion Research Serie 8/ 564-567 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Lei XU [共著者]Yuya FUJIOKA,Akihisa OGINO,Masaaki NAGATSU
[45]. Field Emission Properties of the Nano-structured WO3 Arrays Fabricated Using Tungsten Hot Filament Chemical Vapor Deposition Method
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 48/ 090206 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Di LU [共著者]Akihisa OGINO,Bo LIANG,Jiabin LIU,,Masaaki NAGATSU
[46]. Sterilization of Tubular Medical Instruments Using Wire-Type Dielectric Barrier Discharge
J. of Plasma and Fusion Research Series 8/ 568-572 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Hiroyuki ETO [共著者]Yoshihito ONO,Akihisa OGINO,Masaaki NAGATSU
[47]. Effect of Plasma Pretreatment on Heparin Immobilization on Polymer Sheet
J. Photopolymer Science and Technology 22/4 461-466 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Akihisa Ogino [共著者]Suguru Noguchia,Masaaki Nagatsu
[48]. Investigation of Low Temperature Plasma Capabilities to Modify The Structure and Function of Bio-polymers
J. of Automation, Mobile Robotics & 3/ 150-152 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Iuliana Motrescu [共著者]Takuya Hara,Akihisa Ogino,Shigeyasu Tanaka,Taketomo Fujiwara,Hirokazu Kawagishi,Shinya Kodani,Gheorghe Popa,Masaaki Nagatsu
[49]. Study of Low Temperature Inactivation of Spores Using Microwave Excited Air Plasma
J. of Automation, Mobile Robotics & 3/ 108-111 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Masaaki Nagatsu [共著者]Mrityunjai K. Singh,Ying Zhao,Yuya Fujioka,Akihisa Ogino
[50]. Characteristics of 100 nm-Dot Array of Vertically Aligned Carbon Nanotube Field Emitters Fabricated by DC Plasma Enhanced Chemical Vapor Deposition
J. of Plasma and Fusion Research Series 8/ 539-543 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Takafumi MATSUDA [共著者]Jun SATO,Akihisa OGINO,Masaaki NAGATSU
[51]. Low Temperature Growth of Carbon Nano-Materials on Different Catalysts by the Surface-Wave Plasma Technique
J. of Plasma and Fusion Research Series 8/ 544-547 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Di LU [共著者]Akihisa OGINO,Takafumi MATSUDA,Qiang MA,Masaaki NAGATSU
[52]. Sterilization Efficiency of Inactivation Factors in a Microwave Plasma Device
J. of Plasma and Fusion Research Series 8/ 560-563 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Mrityunjai K. SINGH [共著者]Akihisa OGINO,Masaaki NAGATSU,Lei XU
[53]. ZnO nanopowder induced light scattering for improved visualization of emission sites in carbon nanotube films and arrays
NANOTECHNOLOGY 20/ 255201-255207 （2009年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Marcel Mesko [共著者]Qiongrong Ou,Takafumi Matsuda,Tomokazu Ishikawa,Martin Veis,Roman Antos,Akihisa Ogino,Masaaki Nagatsu
[54]. Enhanced Photoluminescence of Nitrogen-doped ZnO Nanoparticles Fabricated by Nd:YAG Laser Ablation
JOURNAL OF PHYSICS D-APPLIED PHYSICS 41/20 205104-205108 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Q. Ou [共著者]K. Shinji,A. Ogino,,M. Nagatsu
[55]. Effects of Ar and N2 plasma pretreatment with biased sample holder on amino group introduction onto polyethylene sheet treated by ammonia plasma
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 47/9 7346-7348 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. Kral [共著者]A. Ogino,M. Nagatsu
[56]. Role of Negative Electric Field Biasing on Growth of Vertically Aligned Carbon Nanotubes Using Chemical Vapor Deposition
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 47/9 7436-7439 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]T. Matsuda [共著者]M. Mesko,T. Ishikawa,J. Sato,A. Ogino,,M. Nagatsu
[57]. Effect of Hydrogen on Amino-group Introduction onto the Polyethylene Surface by Surface-wave Plasma Chemical Modification
JOURNAL OF PHYSICS D-APPLIED PHYSICS 41/ 105213 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. Kral [共著者]A. Ogino,M. Nagatsu
[58]. Characteristics of graphene-layer encapsulated nanoparticles fabricated using laser ablation method
DIAMOND AND RELATED MATERIALS 17/ 664-668 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Q. Ou [共著者]T. Tanaka,M. Mesko,A. Ogino,M. Nagatsu
[59]. Low Temperature Internal Sterilization of Medical Plastic Tubes Using Linear Dielectric Barrier Discharge
Plasma Processes and Polymers 5/ 269-274 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]H. Eto [共著者]Y. Ono,A. Ogino,M. Nagatsu
[60]. Synthesis of vertically aligned carbon nanotubes on submicron-sized dot-catalyst array using plasma CVD method
DIAMOND AND RELATED MATERIALS 17/ 772-775 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]T. Matsuda [共著者]M. Mesko,A. Ogino,M. Nagatsu
[61]. Cathodeluminescence Property of ZnO Nanophosphors Prepared by Laser Ablation Technique
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 47/1 389-393 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Q. Ou [共著者]T. Matsuda,M. Mesko,A. Ogino,M. Nagatsu
[62]. Low-Temperature Sterilization of Wrapped Materials Using Flexible Sheet-Type Dielectric Barrier Discharge
APPLIED PHYSICS LETTERS 93/ 221502-221504 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Hiroyuki Eto [共著者]Yoshihito Ono,Akihisa Ogino,Masaaki Nagatsu
[63]. Effects of Low Temperature Surface-wave Plasma Treatment with Various Gases on Surface Modification of Chitosan
APPLIED SURFACE SCIENCE 255/ 2347-2352 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]A. Ogino [共著者]M. Kral,M. Yamashita,M. Nagatsu
[64]. Investigation into the Antibacterial Property of Carbon Films
DIAMOND AND RELATED MATERIALS 17/ 1416-1419 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]H. Zhou [共著者]L. Xu,A. Ogino,M. Nagatsu
[65]. Functionalization of Polymers Surfaces Using Microwave Plasma Chemical Modification
J. Photopolym. Sci. Technol. 21/2 257-262 （2008年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Masaaki Nagatsu [共著者]Martin Kral,Eiki Anzawa,Suguru Noguchi,Akihisa Ogino
[66]. マイクロ波プラズマを用いた医療材料低温プロセス技術
表面技術 58/12 117-120 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]永津雅章 [共著者]荻野明久
[67]. Low-Temperature Nitrogen Introduction onto Polyurethane Surface by Means of Surface-wave Excited N2/H2 Plasma
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 46/11 7470-7474 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. Kral [共著者]A. Ogino,K. Narushima,N. Inagaki,M. Yamashita,M. Nagatsu
[68]. Characteristics of direct current micro-hollow cathode discharges combined with dielectric barrier discharges as pre-ionizer
APPLIED PHYSICS LETTERS 91/ 221507 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]J. Watanabe [共著者]A. Ogino,M. Nagatsu
[69]. Diagnostics of surface-wave plasma with air-simulated N2-O2 gas mixture for low-temperature sterilization
JOURNAL OF PHYSICS D-APPLIED PHYSICS 40/ 803-808 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]L. Xu [共著者]H. Nonaka,H. Zhou,A. Ogino,T. Nagata,Y. Koide,S. Nanko,I. Kurawaki,M. Nagatsu
[70]. Gas barrier properties of hydrogenated amorphous carbon films coated on polymers by surface-wave plasma CVD
THIN SOLID FILMS 515/ 3597-3601 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]A. Ogino [共著者]M. Nagatsu
[71]. Characteristics of Nano-crystalline Diamond Films Prepared with Ar/H2/CH4 Microwave Plasma
THIN SOLID FILMS 515/ 4258-4261 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. Miyake [共著者]A. Ogino,M. Nagatsu
[72]. Optical and Mass Spectroscopy Measurements of Ar/CH4/H2 Microwave Plasma for Nano-crystalline Diamond Film Deposition
DIAMOND AND RELATED MATERIALS 16/ 675-678 （2007年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]H. Zhou [共著者]J. Watanabe,M. Miyake,A. Ogino,M. Nagatsu
[73]. Low-temperature Surface Amination of Biopolymer Using Surface-wave Excited Ammonia Plasma
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 45/10B 8494-8497 （2006年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]A.Ogino [共著者]M. Kral,K. Narushima,M. Yamashita,M. Nagatsu
[74]. Production of Large-area Surface-wave Plasmas with Internally Mounted Planar Cylindrical Launcher
PLASMA SOURCES SCIENCE & TECHNOLOGY 15/ 37-41 （2006年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. Nagatsu [共著者]K. Naito,A. Ogino,S. Nanko
[75]. Narrow multi-walled carbon nanotubes produced by chemical vapor deposition using catalytic metal-carbon nanoclusters
CARBON 44/ 3336-3341 （2006年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]M. Nagatsu [共著者]T. Yoshida,M. Mesko,A. Ogino,T. Matsuda,T. Tanaka,H. Tatsuoka,K. Murakami
[76]. Discharge Conditions for CW and Pulse-Modulated Surface-wave Plasmas in Low-Temperature Sterilization
JOURNAL OF PHYSICS D-APPLIED PHYSICS 39/ 148 （2006年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]L. Xu [共著者]F. Terashita,H. Nonaka,A. Ogino,T. Nagata,Y. Koide,S. Nanko,I. Kurawaki,M. Nagatsu
[77]. Characteristics of Surface-wave and Volume-wave Plasmas Produced withInternally Mounted Large-Area Planar Microwave Launcher
APPLIED PHYSICS LETTERS 87/ 161501 （2005年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Masaaki Nagatsu [共著者]Katsutoshi Naito,Akihisa Ogino,Keigo Ninomiya,Shohei Nanko
[78]. Production of Volume wave Plasma with Cylindrical Planar Microwave Launcher and Two-Dimensional Field Analysis Using FDTD Method
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS 87/ L352 （2005年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Akihisa Ogino [共著者]Katsutoshi Naito,Fumie Terashita,Shohei Nanko,Masaaki Nagatsu
[79]. Output Characteristics of Solar- Power- Driven Thermionic Energy Converter
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 43/ 309 （2004年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]A. Ogino [共著者]T. Muramatsu,M. K,o
[80]. 太陽光で駆動される熱電子発電器用高機能エミッタの開発
電気学会論文誌A(基礎・材料・共通部門誌) 122-A/10 906 （2002年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]村松俊哉 [共著者]荻野明久,神藤正士
[81]. 太陽光照射によるSolar TEC用光トラップ付きエミッタの加熱
電気学会論文誌A(基礎・材料・共通部門誌) 122-A/10 912 （2002年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]荻野明久 [共著者]村松俊哉,神藤正士
[82]. 太陽エネルギーを利用熱電子発電器の発電効率および電極加熱
傾斜機能材料論文集 FGM2000/ 157 （2000年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]荻野明久 [共著者]権部雄一郎,村松俊哉,神藤正士
[83]. Effect of Illumination on Thermionic Energy Converter Characteristics
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REV 39/ 2816 （2000年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]Wei Zheng [共著者]A. Ogino,M. K,o
[84]. 光照射により動作する熱電子発電器の特性
電気学会論文誌A(基礎・材料・共通部門誌) 119-A/ 1120 （1999年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]荻野明久 [共著者]鄭偉,神藤正士
[85]. 高密度プラズマによる熱電子発電器電極の加熱
傾斜機能材料論文集 FGM1997/ 233 （1997年） [査読] 有
[責任著者・共著者の別] 共著者
[著者] [責任著者]荻野明久 [共著者]鄭偉,神藤正士 |